Thin SiO.sub.2 films, a process for producing them and their use

US6017389A · kind A · utility

Assignee

• Institut fuer Neue Materialien gemeinnuetzige GmbH · DE

Inventors

• Helmut Schmidt · Riegelsberg, DE
• Martin Mennig · Idar-Oberstein, DE
• Gerhard Jonschker · Friedrichsthal, DE
• Navin Suyal · Swinton, GB

Key dates

• Filing date: Mar 19, 1998
• Grant date: Jan 25, 2000
• Expiry date: Mar 19, 2018

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/31663
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

Thin SiO.sub.2 films can be produced by hydrolysis and condensation of PA1 a) 40 to 100% by weight of one or more silanes of general formula (I) EQU R.sub.x --Si--A.sub.4-x (I) PA1 in which the groups A are identical or different and stand for hydroxyl groups or hydrolytically separable groups, the groups R are identical or different and stand for hydrolytically non-separable groups, x has the value 0, 1, 2 or 3, x being not less than 1 for 70% by moles of said silanes; PA1 b) optionally in the presence of 0 to 50% by weight of colloidal SiO.sub.2 and/or PA1 c) 0 to 10% by weight of organic binder. The viscous sol thus obtained is worked into a gel film which is heat-treated.