Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
US6020104A · kind A · utility
12Cited by
2References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 27, 1999 |
| Grant date | Feb 1, 2000 |
| Priority date | — |
| Expiry date | Jan 27, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymono-carboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.