PICVD process and device for the coating of curved substrates

US6025013A · kind A · utility

Assignee

• Schott Glaswerke · DE

Inventors

• Martin Heming · Saulheim, DE
• Ulrich Lange · Mainz, DE
• Roland Langfeld · Frankfurt, DE
• Wolfgang Mohl · Worms, DE
• Jurgen Otto · Hattingen, DE
• Volker Paquet · Mainz, DE
• Johannes Segner · Stromberg, DE
• Martin Walther · Bubenheim, DE

Key dates

• Filing date: Jan 22, 1997
• Grant date: Feb 15, 2000
• Expiry date: Jan 22, 2017

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/52
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A PCVD process for producing coating layers of uniform thickness of domed substrates. The substrate surface to be coated is arranged in relation to the gas passage surface of a gas showerhead. In order to determine the appropriate processing parameters, in a first series of tests for one type of substrate to be coated, the size of the gas passage surfaces and the gas mass flows through the gas passage surfaces are kept constant, while the intervals between plasma impulses are gradually modified, from an initial value t.sub.A until an optimum value t.sub.eff is determined, and until the uniformity of the thickness profile of the layers generated on the substrate may no longer be improved. If required, during a second series of tests, the value t.sub.eff may be kept constant, while the thickness profile of the layers is further modified by further optimizing the local parameters and/or the gas mass flows until layer uniformity may no longer be improved. The device includes a gas showerhead subdivided into zones and having gas passage surfaces arranged depending on the substrate being coated. The zones are connected by supply lines to a source of non film-forming gas and to a gas sour…