Photosensitive composition and photosensitive rubber plate
US6025098A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 28, 1997 |
| Grant date | Feb 15, 2000 |
| Priority date | — |
| Expiry date | Mar 28, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/033
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is intended to provide a photosensitive rubber plate which is superior in transparency and strength balance and high in rate of washing with water after light exposure, and a photosensitive composition used for obtaining the rubber plate. The photosensitive composition contains 20-65 parts by weight of a block copolymer having PA1 at least one polymer block A consisting of a polymer containing 95% by weight or more of an aromatic vinyl monomer unit and PA1 at least one polymer block B consisting of a conjugated diene polymer containing 20% by weight or more of a conjugated diene monomer unit and having a vinyl bond content in the conjugated diene monomer unit, of 15-70% by weight. PA1 35-80 parts by weight of a hydrophilic copolymer, the total amount of the block copolymer and the hydrophilic copolymer being 100 parts by weight, PA1 5-300 parts by weight of a photopolymerizable ethylenically unsaturated monomer, and PA1 0.1-10 parts by weight of a photopolymerization initiator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.