Heating apparatus for chemical vapor deposition equipment
US6025575A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 3, 1998 |
| Grant date | Feb 15, 2000 |
| Priority date | — |
| Expiry date | Sep 3, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A heating apparatus for chemical vapor deposition equipment which is capable of providing a uniform temperature distribution, even for a wafer having a large surface area. The heating apparatus may include upper and lower reflection plates, with a heater located between the reflection plates. The apparatus may also include a barrier plate to help provide a uniform heat distribution and to minimize dust generation and metallic pollution on a wafer. The apparatus may also include a heater cover for covering the upper portions of the first reflection plate, the heater and the barrier plate, and the sides thereof. The upper reflection plate, which is installed above the heater cover, may be integrally formed with a gas spraying means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.