Ultrasonic photoresist process monitor and method
US6026688A · kind A · utility
11Cited by
10References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 3, 1997 |
| Grant date | Feb 22, 2000 |
| Priority date | — |
| Expiry date | Oct 3, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2291/048
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
There is provided a monitor and method for monitoring the condition of a photoresist film on a wafer during baking in which the phase of high frequency ultrasonic pulses reflected from the wafer/photoresist interface provides an indication of the condition of the photoresist film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.