Polishing composition
US6027554A · kind A · utility
18Cited by
5References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 14, 1997 |
| Grant date | Feb 22, 2000 |
| Priority date | — |
| Expiry date | Oct 14, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09G1/02
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A polishing composition comprising silicon nitride fine powder, water and an acid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.