Coating film excellent in resistance to halogen-containing gas corrosion and halogen-containing plasma corrosion, laminated structure coated with the same, and method for producing the same
US6027792A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 3, 1997 |
| Grant date | Feb 22, 2000 |
| Priority date | — |
| Expiry date | Jun 3, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to a coating film excellent in resistance to corrosive halogen-containing gas and halogen-containing plasma, a method for producing the same, and technology utilizing the same. More specifically, the coating film includes an aluminum oxide as an essential material and silicon-containing material, and the coating film has such a tightness that the content of the silicon-containing material is 5 wt % or less when reduced to silicon. In other word, the coating film has no peak of a half-value width of 5.degree. or less in X-ray diffraction. In still other word, the coating film is a little short of oxygen having an oxygen-to aluminum atomic ration of 1.3 or more to below 1.5. The present invention provides a laminated structure coated with such a coating film such as a window material for use in a vacuum apparatus, and a method for producing the window material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.