Surface modification of medical implants
US6033582A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 16, 1998 |
| Grant date | Mar 7, 2000 |
| Priority date | — |
| Expiry date | Jan 16, 2018 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61L2400/18
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An irregularly etched medical implant device is provided having random non-uniform relief patterns on the surface ranging from about 0.3 .mu.m to less than about 20 .mu.m in depth. The random, irregular surface as defined by the etch micromorphology and respective dimensional properties are obtained by exposing a surface to a reactive plasma in a chamber wherein said reactive plasma produces a reaction product with the surface to thereby etch the surface, said reaction product or a complex thereof having a vapor pressure lower than a pressure in the chamber; providing a dynamic masking agent during the etching process; and removing the reaction products.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.