Device and fabricating method of non-volatile memory
US6037221A · kind A · utility
17Cited by
2References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 3, 1997 |
| Grant date | Mar 14, 2000 |
| Priority date | — |
| Expiry date | Feb 3, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B69/00
Abstract
A non-volatile memory device includes a substrate, a projection having two sides formed on the substrate, a floating gate formed on the projection, a control gate formed on the substrate including the floating gate, a first impurity region formed in the substrate extended from one side of the projection, and a second impurity region formed in the substrate at the other side of the projection and in the substrate extended from the other side of the projection.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.