Sputtering of lithium
US6039850A · kind A · utility
222Cited by
15References
38Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 29, 1997 |
| Grant date | Mar 21, 2000 |
| Priority date | — |
| Expiry date | May 29, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/352
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Lithium is sputtered from a target with a metallic lithium surface using an alternating sputtering potential with a frequency between about 8 and about 120 kHz, preferably about 10-100 kHz or using a DC sputtering potential and a reverse cleaning potential applied intermittently. The process can be used to apply lithium to electrochromic materials such as coatings on window glass.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.