Process for the preparation by chemical vapor deposition (CVD) of a Ti-A1-N based multilayer coating
US6040012A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 12, 1998 |
| Grant date | Mar 21, 2000 |
| Priority date | — |
| Expiry date | Aug 12, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/34
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to a process for the preparation of a multilayer coating, comprising a stack, on a substrate, of several layers chosen from among layers constituting by TiN and layers constituted by (Ti,Al)N, also known as Ti.sub.1-x Al.sub.x N, the entire coating being produced in a single, continuous operation by thermal chemical vapour deposition (CVD) from a gaseous mixture comprising a reducing gas, such as ammonia or nitrogen, hydrogen and titanium and optionally aluminium chlorides, the nature and/or composition of each deposited layer being instantaneously adjusted by modifying the reducing gas to hydrogen molar ratio in the gaseous mixture. The invention also relates to multilayer coatings comprising (Ti,Al)N layers of variable compositions and in particular with composition gradient. Application to wear-resistant or abrasion-proof coatings having a resistance to oxidation and corrosion, particularly at high temperatures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.