Photoresist composition
US6040112A · kind A · utility
17Cited by
6References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 22, 1998 |
| Grant date | Mar 21, 2000 |
| Priority date | — |
| Expiry date | May 22, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A chemical amplifying type positive photoresist composition, excellent in various properties such as film retention ratio, applicability, heat resistance, sensitivity, resolution, profile and time delay resistance, and not easily affected by environment, which comprises (A) a resin which is converted to alkali-soluble by the action of an acid, (B) an acid generator and (C) a tertiary amine compound having an ether bond; and a fine photoresist pattern can be formed in high precision using the photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.