Method and apparatus for total reflection X-ray fluorescence spectroscopy
US6041096A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 6, 1998 |
| Grant date | Mar 21, 2000 |
| Priority date | — |
| Expiry date | Feb 6, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/076
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and an apparatus for total reflection X-ray fluorescence spectroscopy which facilitates total reflection X-ray fluorescent spectroscopy of a sample having irregularities. Primary X-rays are emitted to a standard sample having a smooth surface at a plurality of irradiation angles, a characteristic X-ray spectrum is measured at each of irradiation angles, a characteristic X-ray intensity and a scattered X-ray intensity are determined therefrom, a calibration coefficient is determined in the form of a function of the scattered X-ray intensity by dividing a know quantity of an analyzed element of the standard sample by the determined characteristic X-ray intensity, a characteristic X-ray spectrum when a measured sample having irregularities on the surface is irradiated with primary X-rays at a reference irradiation angle smaller than a critical total reflection angle is measured a characteristic X-ray intensity and a scattered X-ray intensity for the analyzed element are determined therefrom, a calibration coefficient to be applied to the measured sample is determined on the basis of the determined scattered X-ray intensity, and the quantity of the analyzed element is calculat…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.