Nozzle system for feeding treatment liquid such as a liquid developer on a workpiece
US6042647A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 15, 1998 |
| Grant date | Mar 28, 2000 |
| Priority date | — |
| Expiry date | May 15, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a nozzle system for feeding treatment liquid, a storage tank is equipped with a nozzle comprising an opening and a stopcock which opens and closes said opening. When the stopcock opens the opening, a predetermined amount of liquid developer is dropped from the tank onto a wafer through a narrow gap between the outer surface of the stopcock and the inner edge of the opening. Thereby, the large amount of the liquid developer can be discharged and diffused on the entire wafer surface for a short time. Besides, the liquid amount is controlled with ease, and damage to the wafer is reduced, which enables a high quality of the development.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.