Patent · US Expired

Semiconductor memory circuit device and method for fabricating a semiconductor memory device circuit

US6043118A · kind A · utility

30Cited by
11References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 13, 1997
Grant dateMar 28, 2000
Priority date
Expiry dateFeb 13, 2017

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10B12/31

Abstract

In a semiconductor memory circuit device wherein each memory cell is constituted by a series circuit of a memory cell selecting MISFET and an information storing capacitor of a stacked structure, there are present in a first region as a memory cell array region a first MISFET having a gate electrode and source and drain regions; first and second capacity electrodes and a dielectric film extending onto a first insulating film on the gate electrode; a second insulating film positioned on the second capacity electrode; and a first wiring positioned on the second insulating film, while in a second region as a peripheral circuit region there are present a second MISFET having a gate electrode and source and drain regions; a first insulating film on the gate electrode; a third insulating film on the first insulating film; a second insulating film on the third insulating film; and a second wiring on the second insulating film.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.