Modification of zeolite or molecular sieve membranes using atomic layer controlled chemical vapor deposition
US6043177A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 21, 1997 |
| Grant date | Mar 28, 2000 |
| Priority date | — |
| Expiry date | Jan 21, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2323/38
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A process for modifying surfaces of zeolites and molecular sieve membranes to decrease effective pore size for separation of materials includes atomic layer controlled vapor or liquid deposition. The atomic layer controlled deposition process steps include (i) exposing the surface to a metal atom coordinated with ligand groups having bonds that are hydrolyzable to form molecular bonded structures on the surface, which structures comprise the metal atoms coordinated with the ligand group or a modified ligand group and then (ii) hydrolyzing the bonds and possibly, but not necessarily, cross-linking the bonds in the ligand or modified ligand group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.