Patent · US Expired

Modification of zeolite or molecular sieve membranes using atomic layer controlled chemical vapor deposition

US6043177A · kind A · utility

94Cited by
9References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 21, 1997
Grant dateMar 28, 2000
Priority date
Expiry dateJan 21, 2017

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB01D2323/38
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A process for modifying surfaces of zeolites and molecular sieve membranes to decrease effective pore size for separation of materials includes atomic layer controlled vapor or liquid deposition. The atomic layer controlled deposition process steps include (i) exposing the surface to a metal atom coordinated with ligand groups having bonds that are hydrolyzable to form molecular bonded structures on the surface, which structures comprise the metal atoms coordinated with the ligand group or a modified ligand group and then (ii) hydrolyzing the bonds and possibly, but not necessarily, cross-linking the bonds in the ligand or modified ligand group.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.