Method for forming low surface energy coating
US6045962A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 18, 1998 |
| Grant date | Apr 4, 2000 |
| Priority date | — |
| Expiry date | Mar 18, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G5/14726
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for forming a low surface energy coating for electrophotographic photosensitive body substrates does not require performing a physical surface reforming treatment such as corona discharge, plasma treatment, and the like. The process comprises: forming on the substrate at least one polysiloxane coating material, (B), that has a water contact angle greater than the water contact angle of the substrate; and thereafter forming an outermost surface coating material, (A), on top of coating material (B). The water contact angle of coating material (B) is smaller than the water contact angle of coating material (A). Coating material (A) comprises finely divided silica and a resin of the formula RSiO.sub.3/2, wherein not less than 1 mol % and not more than 80 mol % of the R groups are fluorohydrocarbon groups of 3 to 12 carbon atoms.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.