Patent · US Expired

Process and device for the production of ultra-pure inert gas

US6047561A · kind A · utility

4Cited by
2References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 27, 1998
Grant dateApr 11, 2000
Priority date
Expiry dateJul 27, 2018

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S62/931
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A device and a process for preparing a high-purity inert gas from air, includes the successive steps of: PA1 a) cryogenically distilling compressed air, PA1 b) recovering an impure inert fluid containing hydrogen impurities (H.sub.2) and residual impurities, PA1 c) adsorbing at least some of the residual impurities contained in the impure inert fluid by at least one bed of at least one adsorbent, PA1 d) recovering an intermediate inert fluid containing hydrogen impurities, PA1 e) removing the hydrogen impurities contained in the intermediate inert fluid by permeation, and PA1 f) recovering a high-purity inert fluid in the gas state.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.