Method for providing a resistive lens structure for an electron beam device
US6048244A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 2, 1998 |
| Grant date | Apr 11, 2000 |
| Priority date | — |
| Expiry date | Feb 2, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49099
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for providing a resistive focusing lens structure for an electron beam device including forming a suspension of particles of a mixture of, by weight, of about 33-50% of an oxidic conductive material including about 40-60% of a lead ruthenate, about 25-38% of a lead titanate and about 2-15% of a ruthenium oxide, and of about 50-67% of a glass including about 30-40% of silicon dioxide (SiO.sub.2), about 3-7.5% alumina (Al.sub.2 O.sub.3), and about 53-67% of lead oxide (PbO) in a suspending medium consisting essentially of a non-acidic liquid having a boiling point of less than 150.degree. C., applying the suspension to an inside surface of a glass member to thereby provide a coating of the particles on the inside surface, firing the coating at a temperature of 700-900.degree. C. and before of after firing the coating, patterning the coating. The present method provides highly reproducible resistive focusing lens structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.