Methods and apparatuses for engraving gravure cylinders
US6048446A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 20, 1998 |
| Grant date | Apr 11, 2000 |
| Priority date | — |
| Expiry date | Oct 20, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S205/921
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
The present invention provides several methods for engraving gravure cylinders much more rapidly and at a higher resolution while, at the same time, reducing the engraving cost. The present invention employs a resist that is deposited onto the surface of a gravure cylinder. The resist is capable of being physically and/or chemically changed in response to being exposed to a form of actinic energy, such as a laser beam. The exposed areas of resist allow a material, such as chromium, to be plated onto the surface of the gravure cylinder to form walls that define cells therebetween. In use, the cells contain ink for printing the desired patterns of text and/or images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.