Method for patterning film and method for exposing resist film
US6048668A · kind A · utility
0Cited by
2References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 3, 1998 |
| Grant date | Apr 11, 2000 |
| Priority date | — |
| Expiry date | Feb 3, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Patterning a film by accumulating a first electric charge in a first area of a film under treatment, applying a resist to the film, and subsequently exposing a second area of the resist adjoining the first area to the first electric charge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.