Robust process for the preparation of high chloride emulsions
US6048683A · kind A · utility
9Cited by
11References
10Claims
0Family size
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Key dates
| Filing date | Dec 22, 1998 |
| Grant date | Apr 11, 2000 |
| Priority date | — |
| Expiry date | Dec 22, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C2200/01
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method is disclosed of manufacturing radiation-sensitive emulsions by a pulsed flow double-jet process in which high chloride silver halide grains are grown in the presence of a thioether ripening agent in the dispersing medium in the reaction vessel the silver halide grains exhibiting an average grain roundness coefficient n in the range of from 2 to less than 15.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.