System and method for on-site mixing of ultra-high-purity chemicals for semiconductor processing
US6050283A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 16, 1998 |
| Grant date | Apr 18, 2000 |
| Priority date | — |
| Expiry date | Apr 16, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/2509
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A system and method for mixing and/or diluting ultrapure fluids, such as liquid acids, for semiconductor processing. The system includes first and second chemical dispensers, the first and second chemical dispensers adapted to contain first and second fluids to be mixed, respectively; a process connection between the first and second chemical dispensers which allows the first and second fluids to flow therethrough and intermingle to form a mixed fluid, the process connection further allowing the mixed fluid to flow to a location needed by the operator; and an ultrasonic wave emitting device provided in a location sufficient to transmit an ultrasonic wave through the mixed fluid, the device including means to measure the velocity of the wave through the mixed fluid, and thus indirectly measure a ratio defined by a quantity of the first chemical to a quantity of the second chemical in the mixed fluid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.