Patent · US Expired

Device for extracting gas from an oven for chemical vapor deposition or infiltration in an installation for fabricating composite material parts

US6051071A · kind A · utility

33Cited by
8References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 4, 1997
Grant dateApr 18, 2000
Priority date
Expiry dateJun 4, 2017

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S261/54
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A dry pump (32) has an inlet connected to the oven (10) for the purpose of establishing the desired low pressure conditions inside the oven and for extracting residual gas therefrom, a hydrolysis reactor (50) is connected to an outlet of the dry pump in order to receive residual gases coming from the oven, the hydrolysis reactor includes a first outlet (52) for solid deposits or for acid solutions coming from hydrolysis of the gases it receives, and it has a second outlet (54) for gas which is connected to the atmosphere. Gas injection means (46, 48) are located between the inlet of the dry pump (32) and the hydrolysis reactor (50) to prevent any backflow from the hydrolysis reactor towards the pump. Water feed means (74, 76) are connected to the hydrolysis reactor (50), at least via the second outlet (54) thereof, in order to put into solution the acid vapors that come from the hydrolysis reactor, thereby avoiding discharging them in the atmosphere.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.