Method for treating a waste gas and an apparatus thereof
US6051197A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 4, 1998 |
| Grant date | Apr 18, 2000 |
| Priority date | — |
| Expiry date | May 4, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D45/12
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Disclosed is a method for treating a waste gas and an apparatus thereof capable of reducing the space for establishing the apparatus for treating the waste gas and collecting minute particles formed by oxidizing and cooling the toxic waste gas flown into the apparatus for treating the waste gas through a collecting process without filtering the particles. When treating the waste gas generated in the semiconductor manufacturing process, it is not required to treat a byproduct as in the wet-type treating method and the polymers are collected effectively by means of cyclones separators having different diameters. As a result, as the filtering apparatus is not required excluding the cyclone separators, the cost for establishing the facilities can be reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.