Patent · US Expired

Semiconductor component and method of manufacture

US6051456A · kind A · utility

7Cited by
16References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 21, 1998
Grant dateApr 18, 2000
Priority date
Expiry dateDec 21, 2018

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/038

Abstract

A semiconductor component includes an asymmetric transistor having two lightly doped drain regions (1300, 1701), a channel region (1702), a source region (1916) located within the channel region (1702), a drain region located outside the channel region (1702), a dielectric structure (1404) located over at least one of the two lightly doped drain regions (1300, 1701), two gate electrodes (1902, 1903) located at opposite sides of the dielectric structure (1404), a drain electrode (1901) overlying the drain region (1915), and a source electrode (1904) overlying the source region (1916). The semiconductor component also includes another transistor having an emitter electrode (122) located between a base electrode (121) and a collector electrode (123) where the base electrode (121) is formed over a dielectric structure (1405).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.