Gas flow rate measurement apparatus and method
US6053054A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 26, 1997 |
| Grant date | Apr 25, 2000 |
| Priority date | — |
| Expiry date | Sep 26, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F15/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A gas flow rate measurement apparatus for obtaining a normalized flow rate of a gas having at least one liquid component. The gas travels from an upstream position and in a downstream direction. The gas flow rate measurement apparatus comprises a gas inlet conduit in the upstream position for receiving the gas; a gas flow conditioning section in fluid communication with the gas inlet conduit and in a first downstream position for conditioning the gas to vaporize substantially all of the at least one liquid component without adding any other gas; a flow rate measurement section in fluid communication with the gas flow conditioning section and in a second downstream position more distant from the upstream position than the first downstream position, the flow rate measurement section including at least one sensor for sensing at least one state variable for the gas and generating at least one gas state signal, and a flow rate sensor for measuring an actual flow rate of the gas and generating a flow rate signal, and a processing device operatively coupled to the flow rate measurement section for using the at least one gas state signal and the flow rate signal to obtain the normalized ma…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.