Patent · US Expired

Method of fabricating electron source and image forming apparatus

US6053791A · kind A · utility

30Cited by
0References
28Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 28, 1999
Grant dateApr 25, 2000
Priority date
Expiry dateApr 28, 2019

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2329/00
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A method of fabricating an electron source constituted by a plurality of x-direction wirings arranged on a substrate, a plurality of y-direction wirings crossing the x-direction wirings, an insulating layer for electrically insulating the x- and y-direction wirings, and a plurality of conductive films each of which is electrically connected to the x- and y-direction wirings and has a gap, comprises a conductive film formation step of forming a plurality of conductive films to be connected to the pluralities of x- and y-direction wirings, a grouping step of dividing all the x-direction wirings into a plurality of groups, and a forming step of sequentially performing, for all the groups, a step of simultaneously applying a voltage to all wirings assigned to the same group, thereby forming gaps in the plurality of conductive films. The grouping step includes the steps of assigning a plurality of wirings to each group, and arranging wirings constituting a group between wirings constituting other groups.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.