Reflection system for imaging on a nonplanar substrate
US6061118A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 9, 1999 |
| Grant date | May 9, 2000 |
| Priority date | — |
| Expiry date | Jul 9, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/703
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and a method for focusing an image onto the surface of a nonplanar substrate or device, such as a spherical semiconductor substrate, that substantially eliminates misalignment and overlapping problems between neighboring images. The system includes a plurality of mirrors arranged in a ring, a support reciprocatingly positioned relative to the center of the ring of mirrors for positioning the nonplanar substrate or device relative to the ring of mirrors. The nonplanar substrate or device is positioned such that each mirror will be capable of reflecting a focused image onto the surface of the substrate. The image is generated using a mask positioned relative to the ring of mirrors and illuminated to project the image onto the surface of the nonplanar substrate or device. The method includes the steps of positioning the nonplanar substrate or device within a ring of mirrors; creating a mask having a plurality of segments, wherein each segment has stitching interconnection, and projecting an image of the mask onto the ring of mirrors such that the image is reflected onto the surface of the nonplanar substrate or device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.