Optical exposure systems and processes for alignment of liquid crystals
US6061138A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 5, 1997 |
| Grant date | May 9, 2000 |
| Priority date | — |
| Expiry date | Aug 5, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133788
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to an optical exposure system with partial polarization and collimation components that is useful for exposing alignment layers with light in order to align liquid crystals. The exposure system comprises at least one source of optical radiation, means for partially collimating said optical radiation, means for partially polarizing said optical radiation and means for transporting the substrate and radiation relative to one another. Other embodiments further comprise means for partially filtering the optical radiation and means for some portion of said optical radiation to be incident at an oblique angle relative to said substrate. Other embodiments include processes for aligning liquid crystals using the optical exposure systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.