Aqueous developing solutions for reduced developer residue
US6063550A · kind A · utility
5Cited by
21References
10Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 29, 1998 |
| Grant date | May 16, 2000 |
| Priority date | — |
| Expiry date | Apr 29, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent, an ethoxylated surfactant having the general formula: EQU R--[O--(CH.sub.2 --Ch.sub.2 --O).sub.n ].sub.m --X (I) where R is a hydrophobic group, X is H or an anionic group, m is from 1 to 3, and n is at least about 15, preferably at least about 20, more preferably at least about 30.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.