Magnetron tuning using plasmas
US6064154A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 10, 1998 |
| Grant date | May 16, 2000 |
| Priority date | — |
| Expiry date | Jun 10, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J25/587
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Improved magnetron oscillators that controllably form a plasma within each of its resonant cavities to rapidly change the resonant frequency of each cavity. The present invention also provides for frequency tuning methods for use with magnetron oscillators. The plasma is controllably formed in one or more subcells of each resonant cavity in a manner that alters the electromagnetic field within each cavity. Preferably, a magnetized collisional plasma is controlled to rapidly change the resonant frequency of each cavity. However, many types of plasmas may be used to implement the present invention. Controlling formation of the plasma within each cavity tunes the magnetron oscillator on a submillisecond time scale.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.