Process for producing a ceramic substrate and a ceramic substrate
US6066219A · kind A · utility
9Cited by
6References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 3, 1997 |
| Grant date | May 23, 2000 |
| Priority date | — |
| Expiry date | Feb 3, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The invention relates to a novel ceramic substrate with at least one layer essentially of aluminum nitride which is provided on at least one surface side with an intermediate or auxiliary layer which contains aluminum oxide and which has a thickness in the range of 0.5-10 microns, and to a process for its production.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.