Patent · US Expired

Aqueous developable photosensitive polyurethane-methacrylate

US6066436A · kind A · utility

3Cited by
7References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 9, 1996
Grant dateMay 23, 2000
Priority date
Expiry dateSep 9, 2016

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G18/672
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Butadiene-polyether prepolymers which can be used in photopolymer resins are prepared by reacting butadiene homopolymer with a stoichiometric excess of isocyanate and then reacting the product with polyether diol. Thereafter the composition is reacted with hydroxyalkyl(meth)acrylate and alkyldialkanolamine. Flexographic printing plates may be prepared using photopolymer resin comprising butadiene-polyether prepolymers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.