Patent · US Expired

Process for producing sulfur-containing organosilicon compounds and synthetic intermediates thereof

US6066752A · kind A · utility

8Cited by
10References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 9, 1999
Grant dateMay 23, 2000
Priority date
Expiry dateApr 9, 2019

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2006/82
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

An object of the present invention is to provide a method of obtaining high-purity sulfur-containing organosilicon compounds having polysulfide structure in a simple manner without treatment at high temperatures or under vacuum. According to the present invention, sulfur-containing organosilicon compounds represented by the formula (R.sup.1 --O).sub.3 --Si--R.sup.2 --S.sub.x --R.sup.2 --Si--(O--R.sup.1).sub.3 is obtained by reacting sulfur, an alkali metal and halogenoalkoxysilane represented by the formula (R.sup.1 --O).sub.3 --Si--R.sup.2 --X (wherein R.sup.1 is a monovalent C.sub.1-5 hydrocarbon, R.sup.2 is a divalent C.sub.1-9 hydrocarbon, X is a halogen, and x is an integral number of 1 to 8).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.