Laser etching of electroluminescent lamp electrode structures, and electroluminescent lamps produced thereby
US6066830A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 4, 1998 |
| Grant date | May 23, 2000 |
| Priority date | — |
| Expiry date | Jun 4, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K2103/50
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A process for manufacturing electroluminescent lamps using a laser beam to remove a material layer of a multi-layer material structure, in which the laser beam has a first energy level directed at a first material layer, e.g., a conductor, laid over a second material layer, e.g., an insulator/substrate. The laser beam is moved in an overlapping fashion such as spiral pattern motion across the first material layer. A part of the first material layer is sublimed exposing a region of the second material under the area where the spiral pattern was applied. Additionally, a second laser beam having a second energy level, e.g., higher than the first energy level, is moved along a path over the exposed second material layer subliming the remaining underlying layers to form the final lamp shape.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.