Radiation-curing or heat-curing organosiloxane compositions containing (methyl) styrene groups

US6068929A · kind A · utility

Assignee

• Wacker Chemie AG · DE

Inventors

• Jochen Dauth · Burghausen, DE
• Josef Wolferseder · Tann, DE
• Bernward Deubzer · Burghausen, DE

Key dates

• Filing date: May 4, 1998
• Grant date: May 30, 2000
• Expiry date: May 4, 2018

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/31663
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

Novel organosiloxane compositions which contain (methyl)styrene groups and can be prepared on the basis of PA1 A) oligomeric or polymeric organosilicon compounds comprising at least one unit of the formula EQU GR.sub.c SiO.sub.(4-c-1)/2 (I) or PA1 at least one unit of the formula (I) and at least one unit of the formula EQU O.sub.(4-c-1)/2) R.sub.c Si--G.sup.1 --R.sub.c SiO.sub.(4-c-1)/2(II) PA1 B) monomeric alkenyloxy compounds, maleates, fumarates, maleimides, (meth)acrylates, (methyl)styrenes, acrylamides, itaconic esters and/or oligomeric or polymeric organosilicon compounds containing on average more than one alkenyloxy, maleate, fumarate, maleimide or (meth)acrylate group, where R are identical or different hydrocarbon radicals which may be halogenated or unhalogenated or a radical of the formula EQU --R.sup.1 --[OCH.sub.2 CH.sub.2 ].sub.o --[OCH(CH.sub.3)CH.sub.2 ].sub.p --[O(CH.sub.2).sub.4 ].sub.q --OR.sup.2, where PA1 R.sup.1 is a linear or branched alkylene radical, PA1 R.sup.2 is a hydrogen atom, an alkyl radical or a radical of the formula --CO--R.sup.3, where R.sup.3 is an alkyl radical, PA1 G is a radical of the formula (IV) --R.sup.4 -(phenyl) which is substituted b…