Alloy target, its fabrication, and regeneration processes
US6071323A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 2, 1998 |
| Grant date | Jun 6, 2000 |
| Priority date | — |
| Expiry date | Mar 2, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B11/10586
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An alloy target comprises at least one rare earth metal element Tb, Dy, Gd, Sm, Nd, Ho, Tm, and Er with a substantial balance of a transition metal element such as Fe, Co and Ni, and has a substantially homogeneous sintered structure and a permeability of 3 or lower. The alloy target is fabricated by a process comprising steps of melting in a high-frequency furnace or crucible furnace, quenching, pulverization, and firing under pressure. After the alloy target has been used up, it is regenerated by mixing alloy powders (to be regenerated) obtained by the mechanical pulverization of the used-up target with the alloy powders obtained at the pulverization step of the aforesaid process to obtain a mixture, and firing the mixture under pressure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.