Patent · US Expired

Method of deposition

US6071676A · kind A · utility

8Cited by

5References

6Claims

0Family size

Assignee

University Court of the University of Dundee · GB

Inventors

James Thomson · Wadsworth, US
James A. Cairns

Key dates

Filing date	Oct 13, 1998
Grant date	Jun 6, 2000
Priority date	—
Expiry date	Oct 13, 2018

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/2043
WIPO fieldOptics
WIPO sectorInstruments

Abstract

There is described a method of chemically depositing a substance. The method is of utility in the direct manufacture of integrated circuits and in the manufacture of a photomask for use in production of integrated circuits. The method involves the use of a compound which degrades into a deposit and a residue when a radiant beam (e.g. a laser beam) or a particle beam (e.g. an electron beam) is applied. The residue and any unreacted compound may be washed off the substrate to which it has been applied. Nanoscale dimensions of the deposit can be achieved. A particularly suitable organometallic compound is tetra-sec butyl diaurum difluoride.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.