Separation of semiconductor material
US6073773A · kind A · utility
1Cited by
6References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 1, 1999 |
| Grant date | Jun 13, 2000 |
| Priority date | — |
| Expiry date | Oct 1, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB07B1/4609
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method and a device for the separation of semiconductor material has the separation procedure carried out on screens coated with ice made of ultrapure water, optionally mixed with particles of semiconductor material. During the separation, the screens are sprayed with ultrapure water and the screen holes are cut free.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.