Patent · US Expired

Separation of semiconductor material

US6073773A · kind A · utility

1Cited by
6References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 1, 1999
Grant dateJun 13, 2000
Priority date
Expiry dateOct 1, 2019

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB07B1/4609
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A method and a device for the separation of semiconductor material has the separation procedure carried out on screens coated with ice made of ultrapure water, optionally mixed with particles of semiconductor material. During the separation, the screens are sprayed with ultrapure water and the screen holes are cut free.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.