Polyhalomethane compound and photosensitive material
US6074813A · kind A · utility
6Cited by
4References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 27, 1997 |
| Grant date | Jun 13, 2000 |
| Priority date | — |
| Expiry date | Mar 27, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/34
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A polyhalomethane compound represented by the following formula and a silver halide photosensitive material containing the same are disclosed. ##STR1## (Q.sub.1 represents a 1,2,4-triazole ring, etc., Z.sub.1 and Z.sub.2 each represents a halogen atom, Y represents --SO.sub.2 --, etc., and A represents a halogen atom, etc.) The polyhalomethane compound is useful as a highly active antifoggant which enables photosensitive materials, especially of the heat development type, to have excellent raw-stock storage stability and image storage stability when stored in a stacked state, without reducing sensitivity nor impairing color tone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.