Patent · US Expired

Method of fabricating suspended single crystal silicon micro electro mechanical system (MEMS) devices

US6074890A · kind A · utility

64Cited by
14References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 8, 1998
Grant dateJun 13, 2000
Priority date
Expiry dateJan 8, 2018

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01H2001/0078
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A method of fabricating MEMS devices having a master/slave structure in which the motion of a signal device is slaved to a control device through the fabrication of a mechanical coupler. The preferred fabrication uses a backside dry etch to release the suspended MEMS devices and mechanical coupler.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.