Programmable substrate support for a substrate positioning system
US6077026A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 30, 1998 |
| Grant date | Jun 20, 2000 |
| Priority date | — |
| Expiry date | Mar 30, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/137
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A programmable substrate support including a first substrate support that mates with a second substrate support to enable automatic switching between different types of substrates. The first substrate support is configured to support a first type of substrate and to mount to a substrate positioning system to enable handling of substrates of the first type. The second substrate support is configured to support a second type of substrate, and is further configured to mate with the first substrate support to form a mated configuration. The mated configuration enables the substrate positioning system to handle substrates of the second type. In a semiconductor wafer processing embodiment, the first substrate support is an end effector capable of handling wafers of a first size, such as 200 millimeter (mm) wafers, and the second substrate support is another end effector capable of handling wafers of a second size, such as 300 mm wafers. Of course, any size and type of substrate is contemplated. The first and second end effectors include complementary couplers that enables the second end effector to mount on top of the first end effector in the mated configuration. The complementary coupl…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.