Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes
US6077621A · kind A · utility
47Cited by
8References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 6, 1998 |
| Grant date | Jun 20, 2000 |
| Priority date | — |
| Expiry date | Jan 6, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The invention is to a dual beam process for providing an ion-conducting membrane with a thin metal or metal-oxide film. The process includes the cleaning of a membrane surface with a low energy electron beam followed by the deposition of the metal or metal-oxide film by a high energy electron beam of ions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.