Polymers and photoresist compositions
US6077643A · kind A · utility
17Cited by
18References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 28, 1997 |
| Grant date | Jun 20, 2000 |
| Priority date | — |
| Expiry date | Aug 28, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. The polymers of the invention include acid labile groups that contain isobornyl moieties and groups that contribute to aqueous development of a photoresist such as phenolic groups.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.