Production of water-less lithographic plates
US6077645A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 26, 1999 |
| Grant date | Jun 20, 2000 |
| Priority date | — |
| Expiry date | Jan 26, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0752
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is described a water-less lithographic plate precursor which comprises on an aluminium plate a light-sensitive composition which comprises a polymer with hydroxy functional groups, an acid generator which when light exposed yields an acid together with a silyl ether of general formula (I), where Rf is a fluoroaliphatic group having 3 to 10 carbon atoms, Y is oxygen, SO.sub.2, carbonyl or a direct link, X is N R.sub.4 where R.sub.4 is hydrogen or lower alkyl having up to six carbon atoms or is a direct link, each of R.sub.1, R.sub.2 and R.sub.3 are lower alkyl groups having up to six carbon atoms and R.sub.5 is a lower alkyl group having up to six carbon atoms. ##STR1##
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.