Field emission device having an amorphous multi-layered structure
US6078133A · kind A · utility
17Cited by
1References
5Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 25, 1998 |
| Grant date | Jun 20, 2000 |
| Priority date | — |
| Expiry date | Feb 25, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2201/319
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An amorphous multi-layered structure (100, 200) is formed by a method including the steps of: i) positioning a deposition substrate (101) in a physical vapor deposition apparatus, (300, 400, 500) ii) ionizing a precursor of a multi-phase material within the physical vapor deposition apparatus (300, 400, 500) iv) modulating the total ion impinging energy of the ions to deposit layers having predetermined properties corresponding to the total ion impinging energy values.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.