System for configuring a process control environment
US6078320A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 18, 1998 |
| Grant date | Jun 20, 2000 |
| Priority date | — |
| Expiry date | Feb 18, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S715/967
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A control studio object system is disclosed which allows a process control environment to be easily and quickly configured or modified. The control studio object system includes a stencil portion having stencil items conforming to algorithms and a diagram portion to which the stencil items may be copied via a drag and drop operation. Because the stencil items are objects which contain all of the information required by a diagram portion to create an object that contains all of the information necessary to program the process control environment, the completed diagram portion reflects the actual configuration of the process control environment. Additionally, providing the stencil items as objects allows the diagrammed environment to be installed directly to nodes without requiring the diagram to be compiled or rewritten in a language conforming to the node.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.