Sub-micron chemical imaging with near-field laser desorption
US6080586A · kind A · utility
66Cited by
1References
11Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 5, 1996 |
| Grant date | Jun 27, 2000 |
| Priority date | — |
| Expiry date | Apr 5, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/25875
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention discloses an improved method and apparatus for analyzing the surface of materials using sub-micron laser desorption gas phase analysis. The method uses a combination of Near-field Optical Microscopy and Time-of Flight Mass Spectroscopy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.